Laser exposure under controlled conditions allows
engineering of a material surface to increase
or decrease its roughness, to perform localized
or large-area surface heating and controlled
activation of dopants.
Specific applications include doping of
silicon and silicon carbide, annealing
of silicon, and formation of
Ohmic contacts.
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Lasers provide a means of heating with two powerful attributes: • The amount of applied energy can be very precisely controlled, and is usually confined close to the material surface
• The point of application of that heat can be defined down to a few microns
IPG provides production solutions spanning a range of laser wavelengths, energies and beam delivery systems. We work with customers to experimentally determine optimum process conditions for the application, then engineer solutions that deliver uniform repeatable automated performance. System: Selective Laser Annealing Laser: QCW UV Fiber Laser |
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